Physical vapor deposition (PVD) coating — sputtering (DC magnetron, RF, HiPIMS), evaporation (e-beam, arc), coating types (TiN, TiAlN, CrN, DLC, AlTiN), deposition parameters (substrate temperature, bias voltage, target power, Ar/N₂ partial pressure), coating properties (hardness H [GPa], H/E ratio, residual stress, adhesion Lc [N]), Rockwell HF scratch test, coating thickness (1–10 μm), fatigue and tribological performance, and ASTM B244/B568 coating standards.
